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  • Chamber furnace / diffusion / controlled atmosphere / wafer

Waferhandling Diffusion

Article: 00010771

Chamber furnace / diffusion / controlled atmosphere / wafer

To generate a voltage potential within the solar cell, phosphorus atoms are diffused into the crystal lattice of the wafers. This process is accomplished in a diffusion furnace using a phosphorus atmosphere. Due to the high process temperature for processing, the wa- fers have to be transferred from the transport carrier into a quartz boat, which is fed into the furnace for processing. The baumann Waferhandling Diffusion automates this loading/unloading process and employs a specially developed gripper tech- nology which ensures high handling reliability. The system incorporates a 6-axis robot, al- lowing highly flexible loading sequences with maximum accuracy. An optionally integrated resistivity measurement system tracks the process performance.

Specifications

  • Type: chamber
  • Function: diffusion
  • Atmosphere: controlled atmosphere
  • Product applications: wafer

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