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  • Evaporator / electron beam / vacuum
  • Evaporator / electron beam / vacuum
  • Evaporator / electron beam / vacuum

EVA450

Article: 00042645

Evaporator / electron beam / vacuum

Located halfway between development and production tool, this vacuum evaporator has been developed so as to offer multiple configurations. For instance :
Mono or multi pockets sources;
Electron beam source;
Thermal source (Joule, effusion);
Etc.


Thanks to its dimensions, several sources can combine. Concerning substrate holder we offer either domes (simple or planetary motion) or functional single wafer. The thickness measurement is achieved using quartz crystal balance, remotely interfaced to the PLC sequences controller. This software allows to realize, in automatic mode, complex multilayers.

EVA 451 model, which is characterized by the presence of a load lock wafer or substrate introduction chamber is compatible with our CT cluster platform.

Specifications

  • Type: electron beam, vacuum

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