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ADP200 series

Article: 00054404

Profiler

Series ADP200 With Sample Load Lock
Industrial LEED and AES Depth Profiler
Nano-scale measurements of elemental composition on thin films and alloys

Analytical system based on LEED and Auger Electron Spectroscopy and Argon ion sputtering for composition and thickness depth profiling of thin films and alloys
Features:

Sub-nanometer precision for atomic structures, composition and thickness
Analysis of wide range of samples
Semi-automatic operation

Specifications:
Specifications for Series ADP200
Industrial Leed and AES Depth Profiler
AES Analyzer

Analyzer Type: retarding field analyzer with coaxial electron gun
Energy Resolution: less than 0.5%
Working Distance: 10mm
Detector: channel Electron Multiplier with 1x10 7 -10 8 gain range
Mounting Flange: 4.5" O.D. standard CF flange (NW63CF)

Electron Gun:

Type: double electrostatic lenses with adjustable focal length and beam diameter
Beam Voltage: 0 to 3kV
Beam Current: up to 50FA
Beam Diameter: up to 800Fm
Filament: tungsten hairpin wire
Magnetic Shielding: Mu-metal tube with front cover

Ion Sputtering Gun

Ion Source: Electron impact ionization in magnetic field
Ionization Cathode: Tungsten - rhenium filament
directly mounted on the 70mm O.D. CF flange
Beam Current: up to 10uA
Beam Energy: 0 - 3.0keV
Beam Size: from 5 to 25mm in diameter
Beam Uniformity: Less than 5%
Gas Input: Direct gas input to ion source via leak valve
Mounting: 23/4" (70mm ) O.D. CF flange

Specifications

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