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ALLIANCE CONCEPT

  • PVD deposition machine / sputtering / thin-film / vacuum
  • PVD deposition machine / sputtering / thin-film / vacuum
  • PVD deposition machine / sputtering / thin-film / vacuum

CT100

Article: 00154732

PVD deposition machine / sputtering / thin-film / vacuum

The philosophy of this brand-new development is to offer a high quality multi-chamber sputtering system at an afforbale cost so that it can fit any tight budget.

This equipment has two modules based on either one of our best-sellers, the DP560or the AC450, isolated from each other by a load lock, in order to get close to zero particulate contamination.

Central load lock introduction used also for transfer CT100: vacuum chamber with manual transfer (Alliance Concept) {JPEG}
Manual vacuum transfer with high precision
Planar deposition chamber
Convergent-deposition chamber
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This brand-new CT100 clustertool is the manual two-chamber version of our CT200, automated clustertool, that can host up to 6 chambers.

Specifications

  • Method: PVD
  • Technology: sputtering
  • Deposition type: thin-film
  • Other characteristics: vacuum

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