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Veeco

  • High-temperature source for molecular beam epitaxy (MBE) system

Article: 00100347

High-temperature source for molecular beam epitaxy (MBE) system

The High-temperature source is manufactured by Veeco. The product has an outstanding molecular beam epitaxy or MBE framework source application, for low-vapor pressure materials at a maximum temperature of 2000° C, which can be availed via Veeco's High Temperature Source. This device delivers extremely consistent beam flux for low-vapor pressure materials and it has completely detachable tungsten filaments and heat shielding orifice and reduces consumer expense and it the up-time is maximized.

The utilization of refractory metals in hot zone, PBN ceramics in cooler regions, avoids out-gassing. This source utilized only refractory metals in the hot zone of the cell, with isolating ceramics like PBN in cooler regions to avoid out gassing during application.

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