• ArF light source / UV / high-power / for photolithography

193 nm, 10 mJ | XLR 500i

Article: 00189891

ArF light source / UV / high-power / for photolithography

The XLR 500i is built upon the solid foundation already established by the MOPA-based, dual-chamber XL Series product line. The XLR 500i is specifically designed for high NA immersion scanner lithography tools, targeted for 45nm semiconductor ...

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