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Induction heating equipment

GT Advanced Technologies

  • Crucible furnace / sublimation / induction / silicon carbide
  • Crucible furnace / sublimation / induction / silicon carbide

SiClone? 100

Article: 00065901

Crucible furnace / sublimation / induction / silicon carbide

The SiClone? 100 is designed for growing bulk semiconducting silicon carbide single crystals that can be finished into wafers up to 100 mm in diameter, using a sublimation growth technique or more generally known as PVT (Physical Vapor Transport). A solid-state induction heating unit is used to heat the crucible up to ~2600 °C.

In its initial offering, the SiClone 100 is targeted at customers who have developed their own hot zone, qualified a bulk crystal production recipe and are looking to begin volume production.

The furnace is equipped with state-of-the-art controls based on the Siemens® Simatic® WinAC® software. The growth process is completely automated with the electronics and the human-machine interface connected to the furnace frame. Relevant process and event data is logged to a local database on each furnace and can be exported to a simple text file. This data can also be collected by an optional plant supervision system if furnaces are connected to a central server via a network interface module (e.g. via Ethernet).

Specifications

  • Type: crucible
  • Function: sublimation
  • Heat source: induction
  • Product applications: silicon carbide

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