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  • Plasma surface treatment machine / for wafers

V10-G

Article: 00174379

Plasma surface treatment machine / for wafers

The batch system V10-G is designed for the removal of photoresists. Furthermore it can be optimally used for the cleaning of wafers. Areas of application Ideal system for removing photoresist layers (also SU-8) after dry processes ...

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In this category | In this category, (PINK GmbH Thermosysteme)

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