• Chemical vapor deposition reactor / custom / process / for gas-to-fuel conversion applications
  • Chemical vapor deposition reactor / custom / process / for gas-to-fuel conversion applications

GRC series

Article: 00117884

Chemical vapor deposition reactor / custom / process / for gas-to-fuel conversion applications

Iberica Vacuum offers a range of low-cost, point of use dry abatement systems for semiconductor processing. Each system uses the unique hot bed reactor technology developed for the GRC (Gas Reactor Column) range. The inline 250 is the highest performance of any dry abatement technology for etch exhausts. It provides treatment by chemical reaction to stable inert salts and treats the widest range of gases from halogens and acids to CIF3, NF3, SF3 and other halide etch compounds. The The M150 Single GRC is a compact dry gas treatment system for removing hazardous etch and CVD emissions at the source, converting them into harmless solids within an easily changed and disposable cartridge.

Specifications

  • Type: chemical vapor deposition
  • Other characteristics: custom
  • Laboratory/process: process
  • Applications: for gas-to-fuel conversion applications

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