• Chemical vapor deposition reactor / floor-standing / process

SDR?

Article: 00117885

Chemical vapor deposition reactor / floor-standing / process

GT Advanced Technologies chemical vapor deposition (CVD) reactors are proven, fast-rate production chambers that use the popular Siemens-type process technology to manufacture electronic grade or solar grade polysilicon. The SDR?500 offers reliability and repeatability in a low maintenance process platform, desirable for high-volume manufacturing.

Production capacity for the SDR500 reactor is greater than 500 MTA. The SDR500 operates at a highly efficient power consumption rate of

Specifications

  • Type: chemical vapor deposition
  • Other characteristics: floor-standing
  • Laboratory/process: process

Other items

In this category | In this category, (Gt Advanced Technologies)

Leave request for price calculation right now, we will send you best prices.