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GR-300 series

Article: 00138190

Gas pressure controller

Wafer back side cooling system GR-300 series
Overview

The GR-300 series can control gas used to cool the back side of wafers that are fixed in position by an electrostatic chuck system. Suitable for cooling systems using Helium, and gas control of wafer cover gas using Argon.

With the addition of the mass flow sensor option it is possible to monitor gas flow rate.

Specifications

  • Options: gas

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