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Inspection Machines For The Electronics Industry

Oai

  • UV-flood exposure system / with edge-bead removal

Model 2000AF

Article: 00069196

UV-flood exposure system / with edge-bead removal

The OAI 2000 series can be configured as a Flood Exposure System ( 2000 OEBR) or Edgebead Exposure System ( 2000AF). Both feature a UV light source, intensity controler, power supply from 200w to 2000 w and a robotic substrate handling system. The UV light source has adjustable beam intensity with divergence half-angles less than 2.0%. The intensity controller sensors are connected to the light source, offering direct intensity control. The robotic substrate handling system is microprocessor-operated, and is programmable for the accommodation of different substrate sizes.

The 2000 AF system can be configured as an Edgebead Exposure System, 2000 OEBR, that has a shadow mask function which allows the user to pattern the substrate top while being held very close to the mask. This system is very precise, down to a 6 micron resolution at a separation of 25-microns and is a cost-effective solution.

Specifications

  • Options: UV-flood, with edge-bead removal

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