• Wavelength measuring device / size / optical / laser

S3000S?

Article: 00069214

Wavelength measuring device / size / optical / laser

The S3000S? Metrology System is designed for in-line process control of 300mm advanced diffusion and fabwide thin film applications.

Its innovative optical design enables simultaneous measurement with multi-wavelength, multi-angle Focused Beam Ellipsometry (FBE) and deep ultraviolet reflectometry (DUVR), reducing measurement time and significantly increasing throughput over previous generations.

Specification

True fabwide capability for all single and multilayer FEOL and BEOL applications at the 32nm and 28nm nodes and beyond
Incorporates high-intensity, long-life laser light sources for superior measurement stability
Best in class tool-to-tool and fab-to-fab matching through intrinsic methods - no software correlation
Highly repeatable characterization of complex single and multilayer films
Small beam size enables measurements in test sites as small as 50x50 microns
Optional 190 DUV-reflectometer provides highly repeatable measurements for 193nm lithography processes and complex multilayer films
Optional wafer stress/bow (WSWB) for integrated measurements of film stress and wafer bow
Optional Cognex PatMAX® geometric pattern recognition software provides robust performance for wafers with extreme color variation or extremely low contrast
Optional MACControl module for one-step, uniform, non-destructive removal of AMC layer

Specifications

  • Measured value: wavelength, size
  • Technology: optical, laser
  • Other characteristics: in-line
  • Applications: process, for the semiconductor industry

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